Dissociation of tetramethylsilane in a plasma (Plasma Process Polym 17, 2020, 1900243)

Residual gases analysis after dissociation of tetramethylsilane (TMS) during the synthesis of silicon carbide (SiC) nanocrystals (NCs) by an atmospheric pressure microplasma was used to provide details that can contribute to the understanding of the formation mechanisms of NCs (Plasma Processes and Polymers 17, 2020, 1900243).